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Kapteos S.A.S.






Applications requiring E-field (EMF) measurements in harsh environment

We are surrounded by electromagnetic fields (or EMF) without knowing it.
Many applications generate EMF fields and more and more standards strive to characterize their limits. Manufacturers also are interesting in a comprehensive understanding of the EMF generated by their applications in order to improve their performances.
Kapteos is targeting the below applications where our products and services would be of interest to the relevant organisation.
EMF measurements solutions in harsh environment is our centre of expertise.


Specific Absorption Rate (SAR) assessment

The Specific Absorption Rate assessment allows to measure the exposition of electric fields on people.
These measurements are based on standards and must be now performed inside a phantom (new European directive).
The eoProbe can be used in any liquids and complies with this new directive.

Medium and high voltage (HV) electric components

The measurement of electric fields in medium or high voltage systems or components allows to analyse defects like partials discharges and aging of components and also exposition of people to electric fields. The eoProbe is fully insulated, hence can be used in these specific conditions.

Example of specific projects

  • 25kV cable degradation analysis
  • Electric field mapping of a 25kV insulator with partial discharges analysis
  • Analysis of partial and total discharges of a medium voltage system
  • 2D E-field mapping on a HV busbar

  • E-field mapping on 3-phase cable splices at 6.6 kV


The measurement of electric fields in antennas requires near fields measurement with a very wide frequency bandwidth. The measured electric field must contain the amplitude and phase of each component (or axis) of the field vector.
The eoProbe can measure all the frequencies at once. No need to change!

Example of specific projects

  • Mappings of horn antennas or other shapes of antennas


It concerns the measurements of very strong electric field (kV/m to MV/m) in order to ionize a gas containing charged particles.
The measure of this field must be physically very close (few millimetres or less for cold plasma to tens of centimetres for hot plasmas) and very localized.
The Kapteos solution is a unique solution and widely validated by extensive testings.

Example of specific projects

  • In-situ plasma mappings with different environments such as biological or magnetic

  • Absolute measurements of electromagnetic pulses (EMPs) generated by laser-plasma interaction in nanosecond regime

  • Measurement of penetration depth of the plasma E-field inside biological liquids

Magnetic Resonance Imaging (MRI)

The topic is to measure the exposure of people to electromagnetic fields.
The radio frequencies field analysis is required with a very high spatial resolution.
The measure must be performed under a magnetic field of 3 or 4.7 Tesla depending on the MRI model.
The eoProbe can measure these harsh environments without any issues.

Example of specific projects

  • Measurement tests of electric fields under 3 and 4.7 Tesla

  • Vectorial E-field mapping inside a phantom exposed to 100 MHz EM waves generated by an hyperthermia applicator inside a MRI machine

In some cases, it is necessary to measure a low rms signal from the MRI machine. Using specific parameters of a spectrum analyzer, it is still possible to measure this low rms signal in time domain.

Electro-Magnetic Compatibility (EMC)

The EMC is a vast subject that covers many applications like variable speed drives, solar or windmills inverters, uninterruptible power supplies (UPS), welding, railways, mining, marine, aircraft, … When it comes to the investigations of root causes of malfunctions (design phase or during normal operation), the very compact design of the eoProbe sensor is very useful for a rapid diagnostic.

Example of specific projects

  • Electric field mapping of a bus bar inside an electrical network infra-structure
  • Measurement of perturbations on a catenary bus bar linked to contacts between pantographe and catenary